• 专利附录
  • 专利说明
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    • 专利摘要:
    Element fungible for bombardment with particles and method of determination of engraving of said element. A fungible element (1) provided with a target (2) for bombardment with particles for performing physical deposition of thin layer in vapor phase on a substrate (3), the fungible element (1) comprising a base layer (4) on the that the target (2) is deposited, the target being intended to be pulverized by the bombardment with particles, wherein the target is constituted by at least one layer (21) in which a plurality of zones are defined (x <sub > i, andi) with average thickness (ei (xi), andi )) variable between the zones (xi, andi), the average thicknesses being (ei (xi, andi)) of each zone (xi, andi) sized so that, under certain bombing conditions, all the zones (xi, andi) have an identical ion spray time (ti). The invention also relates to a set of bombardment device with particles (5) and fungible element (1) and a method for obtaining the consumable (1). (Machine-translation by Google Translate, not legally binding)
    公开号:ES2584961A1
    申请号:ES201530440
    申请日:2015-03-31
    公开日:2016-09-30
    发明作者:Enric Bertrán Serra；Roger AMADE ROVIRA
    申请人:ADVANCED NANOTECHNOLOGIES S L；Advanced Nanotechnologies Sl；
    IPC主号:
    专利说明:

    Fungible element for particle bombardment and etching determination procedure of said element Field of the Invention
    The present invention falls within the sector of thin layer coatings, especially by particle bombardment. 10 Background of the invention
    The techniques of physical deposition of thin layer in vapor phase on a substrate are known, which consist of bombarding with a target a target, for example ions or photons, so that it emits the
    15 coating particles (formed by isolated atoms or by the association of a few atoms) that will stop the substrate to be coated.
    When it is desired to make coatings, the procedure consists in arranging a substrate in front of the particle cannon, estimating a suitable bombing time to obtain a certain coating thickness and
    20 bomb for a certain time. The resulting coating thickness is strongly dependent on the bombing time, so it is essential to have a very precise control of the bombing time to obtain the desired results.
    On other occasions, more complex coatings are desired, for example with different materials of
    25 coating, or multi-layer. In these cases, the different targets must be removed and placed successively, and also precisely control the bombing times, to obtain the desired coatings.
    These tasks are common in the laboratory and can be performed with satisfactory results. Now if
    30 that is desired is to make coatings on an industrial scale, in order to commercialize the coated products on a large scale, this procedure results in prohibitive costs, especially if high quality is desired.
    In particular, the uniformity of the results will depend strongly on each installation and especially the operator who controls the bombing installation.
    Therefore, the inventors have concluded that solutions are lacking that allow reducing the costs of coating and at the same time allow to guarantee an optimum quality of the coating, and especially that allow reducing the dependence of a good coating on the precision in the bombing time. Description of the invention
    For this, the present invention proposes a fungible element provided with a blank for particle bombardment intended to perform physical deposition of thin layer in vapor phase on a substrate, the fungible element comprising a base layer on which the target is deposited, the target being intended to be sprayed by particle bombardment, characterized in that the target is constituted by at least one layer in which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) variable between the zones (xi, yi), the average thicknesses (ei (xi, yi)) of each zone (xi, yi) being sized so that, under certain bombardment conditions, all zones (xi, and i) have a
    50 spray time by identical particle bombardment (ti).
    In this way, the drawbacks of the prior art are overcome. In fact, with the fungible one achieves that the thickness of the coating is dependent on a previously prepared element, instead of making it totally dependent on parameters that an operator must adjust. This allows the stage to be industrialized
    55 coating for any type of coating, either mono or multi-layer, in any procedure that uses a blank for particle bombardment.
    It is no longer necessary to control both the bombing time and the power of the cannon (considering that the barrel's footprint does not vary significantly with the power) to obtain in the substrate
    60 multi-layer structures with net interfaces, ie separation surfaces between different coating layers. The consumable element can be used in the multi-layer tank for interferential optics, for electronic devices, for metallization of single-layer or multi-layer electrical contacts, for ultra-thin single-layer or multi-layer structures - up to monoatomic thicknesses - controlled nano-island deposit or Nanostructures on a substrate, prior to coalescence, among others.
    65 Preferably, the blank is constituted by a plurality of layers.
    Preferably, the blank is constituted by a plurality of layers.
    Advantageously, the different zones (xi, yi) can be of the same material or of different materials.
    The invention also relates to a set of particle bombardment device and fungible element provided with a bombardment target (ionic, with neutral particles or with photons) by the particle bombardment device to perform physical thin layer deposition in phase vapor on a substrate intended to receive the deposition material disposed on the target, the fungible element comprising a base layer on which the target is deposited, characterized in that the target is constituted by at least one layer on which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) varying between the zones (xi, yi) are defined, the average thicknesses (ei (xi, yi)) of each zone (xi, and i) sized so that, when bombarded with the particle bombardment device, all zones (xi, yi) have an identical ionic spray time (ti), so that the thickness of the
    15 layer deposited on the substrate from the previous dimensioning of the thicknesses (ei (xi, yi)) of the deposition material on the target.
    Preferably, in the set the target is constituted by a plurality of layers.
    Advantageously, in the set the different zones (xi, yi) can be of the same material or of different materials.
    As a variant, in the set the bombardment is an ionic bombardment, for example, with sputtering head or with ionic cannon or a bombardment with neutral particles with neutralized ion cannon or with
    25 plasma cannon or similar techniques.
    As another variant, in the set, that the bombardment is a photonic bombardment to produce ablation, for example, with laser (LAD) or photonic bombardment by pulsed laser (PLD) or with similar techniques.
    Preferably, in the assembly of the invention, the head or barrel comprises means for changing its orientation that allow it to be oriented towards the target or towards the substrate, so that it can be switched between an assisted deposition mode with ion or plasma cannon and a direct bombardment compaction mode.
    The invention also relates to a method of determining the pattern of engraving by bombardment of
    35 particles of a blank, for obtaining the engraving speed and thickness (ei (xi, yi)) as a function of the position (x, y) of a fungible element according to any of the mentioned fungible element variants, comprising the stages of:
    a) Make a homogeneous deposit of deposition material on a base layer to obtain a blank of homogeneous thickness; b) Arrange a resin mask on the target, so that there are areas of the target covered by the resin and areas not covered by the resin; c) Arrange the product obtained for a certain time, in a certain position and in front of a particular particle bombardment device to perform a physical deposition process
    45 thin layer in vapor phase on a substrate; d) Remove the resin mask; e) Measure the local differences in heights between points of the target covered by the resin and points not covered by the resin; f) Obtain an engraving speed function vi (xi, yi) of the target for said determined conditions; g) Use the engraving speed function vi (xi, yi) to determine the thickness (ei (xi, yi)) that the target must have in each position (x, y) for the fungible element layer or layers to be Consume one after another.
    Preferably, in the process of the invention, the mask is a grid.
    55 The manufacture of multilayer targets can be done using inkjet printers or printjet type. These printers allow the distribution of the thickness ei (xi, yi) determined by the method of the invention to be reproduced point by point. The resolution is approximately 20 nm, which is the approximate thickness of the ink drops once dried. This technique also allows mixing of various materials and the production of multilayers with the thickness distributions ei (xi, yi) sought.
    Once manufactured, these targets already contain all the information necessary to reproduce the multilayer structures on a substrate, such as ophthalmic lenses and flat contact lens lenses, interference filters, multilayer coatings, optical layers with a gradient, among others, and it is only necessary
    65 project the material, previously deposited on the target, onto the corresponding substrate by means of ionic bombardment, bombardment with ionic particles, bombardment with neutral particles or photonic or laser beam bombardment. Brief description of the figures
    5 To complement the description and in order to help a better understanding of the features of the invention, according to an example of practical implementation thereof, a set of figures is attached as an integral part of the description in which Illustrative and non-limiting, the following has been represented:
    Figure 1 is a white seen in plan, with a grid proposal.
    Figures 2 to 7 are different layer structures in fungible element.
    15 Figure 8 is an installation for particle bombardment.
    Figures 9a to 9d illustrate the different stages for determining the thicknesses sought in each of the target areas.
    Figure 10a illustrates a stratified blank for the application of an optical process to determine the structure of the blank.
    Figure 10b illustrates a device for obtaining target thicknesses.
    Figure 11a illustrates components for manufacturing the fungible element of the invention.
    Figure 11b illustrates in section an installation for manufacturing the fungible element of the invention. Description of an embodiment of the invention
    As can be seen in the figures, the invention relates to a fungible element 1 provided with a target 2 for particle bombardment intended to perform physical deposition of thin layer in vapor phase on a substrate 3, the fungible element 1 comprising a layer of base 4 on which the target 2 is deposited, the target being sprayed by particle bombardment, characterized by the fact that the
    35 white is constituted by at least one layer 21 in which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) varying between the zones (xi, yi) are defined, the average thicknesses being ( ei (xi, yi)) of each zone (xi, yi) sized so that, under certain bombardment conditions, all zones (xi, yi) have an identical time (ti) for particle bombardment spraying.
    In a very simplified manner, this is illustrated in Figure 5. Here, two zones of different thickness e1 and e2 can be seen, which will be subjected to different bombardment intensities. The element has been drawn in a convex shape, although it does not necessarily have to be this way, since this will depend on the distribution of the cannon, and the distribution of the target's output.
    45 Another resulting distribution could be the one shown in Figure 7. In some cases, especially when symmetries occur in the different components of the installation and in the relative arrangement between them, the distribution of thicknesses over the target can be approximated by a curve or simple surface.
    As can be seen in Figures 3, 4 and 6, the blank is constituted by a plurality of layers 21, 22. The layers can be homogeneous, as illustrated in Figures 2 and 3, or heterogeneous, as illustrated in figures 4 and 5.
    The invention, as illustrated in Figure 8, also relates to a set of particle bombardment device 5 and fungible element 1 provided with a target 2 for bombardment (ionic, neutral particles or photons)
    55 by the particle bombardment device 5 to perform physical deposition of thin layer in vapor phase on a substrate 3 intended to receive the deposition material provided on target 2, the fungible element 1 comprising a base layer 4 on which it is deposited the target 2, characterized by the fact that the target 2 is constituted by at least one layer 21 in which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) variable between the zones (xi, yi), the average thicknesses (ei (xi, yi)) of each zone (xi, yi) being sized so that, when bombarded with the particle bombardment device 5, all zones (xi, yi ) have an identical ionic spraying time (ti), so that the thickness of the layer deposited on the substrate 3 can be controlled from the previous dimensioning of the thicknesses (ei (xi, yi)) of the deposition material in the white 2.
    65 The bombardment may be an ionic bombardment with a cathodic spray head or with a plasma ion gun or a neutral particle bombardment with a neutralized ion cannon or with a plasma gun.
    It can also be a photonic bombardment to produce laser ablation (LAD) or photonic bombardment by pulsed laser (PLD).
    As an advantageous option, the head or barrel 5 comprises means for changing its orientation that allow it to be oriented towards the target or towards the substrate, so that it can be switched between an assisted deposition mode with an ion or plasma cannon and a mode of compaction by direct bombardment.
    The invention also relates to a method of determining the pattern of engraving by bombardment of particles of a target 2, for obtaining the engraving speed and thickness (ei (xi, yi)) as a function of
    10 position (x, y) of a fungible element 1 according to any of the variants illustrated in Figures 2 to 7, comprising the steps of:
    a) Perform a homogeneous deposition of deposition material on a base layer 4 to obtain a blank 2 of known homogeneous thickness e0, such as that illustrated in Figure 9a;
    15 b) Arrange a resin mask 6 on target 2, such as the one illustrated by way of a grid in Figure 1, so that there are areas of target 2 covered by the resin and areas not covered by resin 7, such as shown in figure 9b;
    c) Arrange the product obtained for a certain time, in a certain position 1 and in front of a particle bombardment device 5 determined to perform a process of physical deposition 20 of thin layer in vapor phase on a substrate 3, as illustrated in figure 8, so that
    it obtains a target like the one illustrated in figure 9c; d) Remove the resin mask 6, for example by dissolution, to obtain the product illustrated in Figure 9d; e) Measure the local differences in heights between points of target 2 covered by the resin and points 25 not covered by resin 7, which is possible with the target obtained from Figure 9d; f) Obtain an engraving speed function vi (xi, yi) of target 2 for these determined conditions; g) Use the engraving speed function vi (xi, yi) to determine the thickness (ei (xi, yi)) that the target must have in each position (x, y) for the fungible element layer or layers to be 30 consume one after another.
    An optical process with similar results can also be performed through the following stages:
    a) Perform a preferably homogeneous deposition of a semi-transparent deposition material
    35 (very thin metal of the order of a few tens of nanometers, or a semi-transparent material with non-zero optical transmittance spectrum, such as a semiconductor material, or a semi-transparent dielectric) characterized by an optical absorption, α (λ) (where λ is the wavelength), on a transparent base layer 43 to obtain a blank 23 of homogeneous thickness, characterized by an optical absorption, α (λ), such as that illustrated in Figure 10a;
    40 b) Arrange the transparent base layer 43 with the blank 23 of homogeneous thickness, characterized by an optical absorption, α (λ), in a normal incidence lighting device, with a lamp 53, for example white light or monochromatic light of intensity I0, such as that illustrated in Figure 10b. c) Obtain a photographic image by means of photographic device 63, from the back of the system
    45 formed by the transparent base 43 and the target 23 of homogeneous thickness and optical absorption, α (λ), such as that illustrated in Figure 10b, when it is crossed by the incident light beam of intensity I0, which is partially absorbed according to the law of d'Alambert:
    I (x, y) = Io ∙ exp [−∞ ∙ ∞ (x, y)]
    50 where, I (x, y), is the intensity of the light transmitted by the system formed by transparent base 43 and white 23 of homogeneous thickness and optical absorption, α (λ). The variables (x, y) are the coordinates of the target 23, and ∞ (x, y) the thickness at each position of the target 23 after particle bombardment spraying. d) Arrange the product obtained in a) for a certain time, in a specific position 1 and
    55 in front of a particulate bombardment device 5 determined to perform a thin-layer physical deposition process in vapor phase on a substrate 3, as illustrated in Figure 8, so that a blank such as that illustrated is obtained in figure 9c;
    e) Determine the relationship I (x, y) / I or (x, y) point to point of the intensity obtained in each pixel of the photographic images of target 23, before, I or (x, y), and then, I (x, y), of the pulverization by particle bombardment, by means of, for example, the common techniques of image processing or
    those of matrix calculation with the pixels as matrix elements. f) Assuming the linearity of the intensities collected in the photographic images with respect to the intensity of the light beam:
    I (x, y) = ∙ I (x, y)
    where k is a constant, the thickness of the blank 24 can be determined after being sprayed by particle bombardment, as shown in Figure 10c, as a function of the position (x, y) 5 by the expression:
    ÆÆÆ (Æ, Æ)
    ∞ (x, y) = ln
    ÆÆ (Æ, Æ)
    g) Obtain an engraving speed function v (x, y) of target 24 for said determined conditions;
    10 h) Use the engraving speed function v (x, y) to determine the thickness e (x, y) that the target must have in each position (x, y) so that the layer or layers of the fungible element go away consuming one after another.
    i) Use image processing software to, using the appropriate filters and the function of the thickness e (x, y) obtained, generate Di domains of constant thickness, ei (xi, yi) and arbitrary dimensions, 15 covering the surface of the white 24.
    These processes can be performed systematically, that is, they can easily be converted into a protocol, or even automated.
    The invention also relates to a method of manufacturing the fungible element 1, as illustrated in Figure 8, after the determination of the etching speed vi (xi, yi), by means of physical vapor deposition techniques (PVD ) or chemical vapor vapor tank (CVD), which will be applied to obtain mono or multilayer structures on a base layer 45, as illustrated in Figure 11a, comprising the steps of:
    25 a) Perform a PVD or CVD deposition through a mask 75 of rigid material, preferably metallic, with an opening the size of a domain Di, attached on a base layer 45, of adjustable position (x, y), to obtaining a monolayer or multilayer blank with domains of thicknesses ei (xi, yi), as illustrated in Figure 11b; b) Make the deposit of the material to obtain the target 25 monolayer or multilayer by means of a single
    30 process or a repetitive process PVD or CVD, through a mask 75 attached to the base layer 45, sequentially moving the base 45 over each domain Di, as illustrated in Figure 11b, and maintaining the deposition process on each domain Di, for a time τij (xi, yi), determined by the expression:
    ÆÆ (ÆÆ, ÆÆ)
    35 τÆÆ (xÆ, yÆ) = ÆÆÆÆÆÆÆÆÆ ÆÆ (ÆÆ, ÆÆ)
    where ÆÆÆ, ÆÆÆ and ÆÆÆÆ are constants determined respectively by the type of material deposited in each layer of the multilayer system of target 25, by the conditions of the PVD or CVD deposition process of each layer of the multilayer system of target 25 and by the final thicknesses of each layer of
    The material to be obtained on the substrates located above the shell of Figure 8 and the initial thickness obtained on the substrates located above the shell of Figure 8 in the procedure for determining the pattern of etching by particle bombardment. The subscripts i and j indicate respectively the domain and the number of the layer of the multilayer system to be obtained for the manufacture of blank 25.
    C) To calculate the constants ÆÆÆ, ÆÆÆ and ÆÆÆÆ it is necessary to perform a process of calibration of the deposition rates of the PVD or CVD process for each material to be used.
    The invention is not limited to the specific embodiments that have been described but also covers, for example, the variants that can be made by the average person skilled in the art, within what follows from the
    50 claims
    权利要求:
    Claims (13)
    [1]
    1.- Fungible element (1) provided with a target (2) for particle bombardment intended to be carried out
    5 physical deposition of thin layer in vapor phase on a substrate (3), the fungible element (1) comprising a base layer (4) on which the target (2) is deposited, the target being intended to be sprayed by the particle bombardment, characterized by the fact that the target is constituted by at least one layer (21) in which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) varying between zones (xi, yi), the average thicknesses (ei (xi, yi)) of each zone (xi, yi) being sized so that, in
    10 certain bombardment conditions, all zones (xi, yi) have an identical ionic spray time (ti).
    [2]
    2. Element according to claim 1, wherein the blank is constituted by a plurality of layers (21, 22).
    3. Element according to any of the preceding claims, in the different zones (xi, yi) they can be of the same material or of different materials.
    [4]
    4.-Set of particle bombardment device (5) and fungible element (1) provided with a blank (2) for bombardment by the particle bombardment device (5) to perform physical deposition of thin layer 20 in vapor phase on a substrate (3) intended to receive the deposition material provided on the blank (2), the fungible element (1) comprising a base layer (4) on which the blank (2) is deposited, characterized by the fact that the blank (2) is constituted by at least one layer (21) in which a plurality of zones (xi, yi) with average thickness (ei (xi, yi)) variable between the zones (xi, yi) are defined , the average thicknesses (ei (xi, yi)) of each zone (xi, yi) being sized so that, when bombarded with the
    With particle bombardment device (5), all zones (xi, yi) have an identical ionic spray time (ti), so that the thickness of the layer deposited on the substrate (3) can be controlled from the previous dimensioning of the thicknesses (ei (xi, yi)) of the deposition material in the target (2).
    [5]
    5. Set according to claim 3, wherein the blank is constituted by a plurality of layers (21, 22).
    6. Set according to any of claims 4 or 5, in the different zones (xi, yi) they can be of the same material or of different materials.
    [7]
    7. Set according to any one of claims 4 to 6, wherein the bombardment is an ionic bombardment with a cathodic spray head or with a plasma ion cannon or a neutral particle bombardment with a neutralized ion cannon or a plasma cannon .
    [8]
    8. Set according to any of claims 4 to 6, wherein the bombardment is a photonic bombardment to produce laser ablation (LAD) or photonic bombardment by pulsed laser (PLD).
    [9]
    9. Assembly according to claim 7, wherein the head or barrel comprises means for changing its orientation that allow it to be oriented towards the target or towards the substrate, so that it can be switched between an assisted deposition mode with an ion cannon or plasma and a direct bombardment compaction mode.
    45 10.-Procedure for determining the pattern of engraving by bombardment of particles of a target (2), to obtain the engraving speed and thickness (ei (xi, yi)) depending on the position (x, y) of a fungible element (1) according to any one of claims 1 to 3, comprising the steps of:
    50 a) Make a homogeneous deposition of deposition material on a base layer (4) to obtain a blank (2) of homogeneous thickness; b) Provide on the target (2) a resin mask (6), so that there are areas of the target (2) covered by the resin and areas not covered by the resin (7); c) Arrange the product obtained for a certain time, in a certain position and in front of a particle bombardment device (5) determined to perform a deposition process
    thin layer physics in vapor phase on a substrate (3); d) Remove the resin mask (6); e) Measure the local differences in heights between points of the target (2) covered by the resin and points not
    covered by resin (7); 60 f) Obtain an engraving speed function vi (xi, yi) of the target (2) for these determined conditions;
    g) Use the engraving speed function vi (xi, yi) to determine the thickness (ei (xi, yi)) that the target must have in each position (x, y) for the fungible element layer or layers to be Consume one after another.
    [11]
    11. Method according to claim 10, wherein the mask (7) is a grid.
    [12]
    12.-Procedure for determining the pattern of engraving by bombardment of particles of a target (2), in order to obtain the engraving speed and thickness (ei (xi, yi)) depending on the position (x, y) of a fungible element (1) according to any one of claims 1 to 3, comprising the steps of:
    a) Make a deposition, characterized by an optical absorption, α (λ), with λ being the wavelength, 10 on a transparent base layer (43) to obtain a blank (23) of homogeneous thickness, characterized by an optical absorption , α (λ);
    b) Arrange the transparent base layer (43) with the blank (23) of homogeneous thickness, characterized by an optical absorption, α (λ), in a normal incidence lighting device of intensity I0, with a lamp (53) ;
    15 c) Obtain a photographic image by means of a photographic device (63), from the back of the system formed by the transparent base (43) and the blank (23) of homogeneous thickness and optical absorption, α (λ), when it is crossed by the incident light beam of intensity I0, which is partially absorbed according to the law of d'Alambert:
    I (x, y) = Io ∙ exp [−∞ ∙ ∞ (x, y)]
    20 where, I (x, y), is the intensity of the light transmitted by the system formed by the transparent base (43) and the white (23) of homogeneous thickness and optical absorption, α (λ), the variables being ( x, y) the coordinates of the target (23), and ∞ (x, y) the thickness at each target position (23) after particle bombardment spraying;
    D) Arrange the product obtained in a) for a certain time, in a certain position and in front of a particle bombardment device (5) determined to perform a process of physical deposition of thin layer in vapor phase on a substrate (3 );
    e) Determine the relationship I (x, y) / I or (x, y) point to point of the intensity obtained in each pixel of the photographic images of the target (2), before, I or (x, y), and then, I (x, y), of the pulverization by particle bombardment. f) Assume the linearity of the intensities collected in the photographic images with respect to the intensity of the light beam:
    I (x, y) = ∙ I (x, y)
    where k is a constant, to determine the thickness of the target (24) after being sprayed by particle bombardment, as a function of the position (x, y) by the expression:
    ÆÆÆ (Æ, Æ)
    ∞ (x, y) = ln
    ÆÆ (Æ, Æ)
    g) Obtain an engraving speed function v (x, y) of the target (24) for said determined conditions; h) Use the engraving speed function v (x, y) to determine the thickness e (x, y) that the blank must have at each position (x, y) for the fungible element layer or layers to go away consuming one after another.
    i) Use image processing software to, using the appropriate filters and the function of the thickness e (x, y) obtained and generate Di domains of constant thickness, ei (xi, yi) and arbitrary dimensions, covering the surface of the target 24.
    13. Method according to claim 12, wherein the deposition of step a) is homogeneous and of a semi-transparent deposition material.
    [14]
    14. Method according to claim 13, wherein the deposition is a very thin metal of the order of 50 tens of nanometers, or a semi-transparent material with non-zero optical transmittance spectrum, such as a semiconductor material, or a dielectric semitransparent.
    [15]
    15. Method according to any of claims 12 to 14, wherein step b) is performed with white light or monochromatic light of intensity I0.
    16. Method according to any one of claims 1 to 15, wherein step e) is carried out by means of common image processing techniques or matrix calculation techniques with the pixels as matrix elements.
    60 17.-Procedure for manufacturing the fungible element (1), after the determination of the engraving speed vi (xi, yi), by means of physical vapor deposition techniques (PVD) or chemical vapor deposition (CVD) , to obtain mono or multilayer structures on a base layer (45), comprising the steps of:
    a) Perform a PVD or CVD deposition through a mask (75), with an opening the size of a domain Di, attached on a base layer (45), with adjustable position (x, y), to obtain a target
    (25) monolayer or multilayer with domains of thicknesses ei (xi, yi); b) Make the deposit of the material to obtain the blank (25) monolayer or multilayer by means of a PVD or CVD process, through a mask (75) attached to the base layer (45), sequentially
    5 by moving the base (45) on each domain Di, and maintaining the process of deposition on each domain Di, for a time τij (xi, yi), determined by the expression:
    ÆÆ (ÆÆ, ÆÆ) τÆÆ (xÆ, yÆ) ÆÆÆÆÆÆÆÆÆÆ
    =
    ÆÆ (ÆÆ, ÆÆ)
    10 where ÆÆÆ, ÆÆÆ and ÆÆÆÆ are constants determined respectively by the type of material deposited in each layer of the multilayer system of the target (25), by the conditions of the PVD or CVD deposition process of each layer of the multilayer system of the target (25) and by the final thicknesses of each layer of material to be obtained and the initial thickness obtained in the process of determining the
    Engraving pattern by particle bombardment, where subscripts i and j indicate respectively the domain and the number of the multilayer system layer to be obtained for the manufacture of the blank (25).
    [18]
    18. Method according to claim 17, wherein the mask (75) is made of rigid material, preferably metallic.
    19. Procedure according to claim 17 or 18, wherein in step b) a single process or a repetitive process is performed.
    [20]
    20. Method according to any of claims 17 to 19, in which to calculate the constants ÆÆÆ, ÆÆÆ yÆÆÆ a process of calibration of the deposition rates of the PVD or CVD process is performed for each material to be used.
    Y
    Fig. 1 X
    twenty-one
    2
    Fig. 2
    Fig. 322
    Fig. 4
     21 e1e2 21
    Fig. 5 21
    Fig. 6
    21 4
    Fig. 7
    one
    Fig. 9a
    Fig. 10a
    63
    Fig. 10c
    Fig. 11a
    Fig. 11b
    Four. Five
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    同族专利:
    公开号 | 公开日
    WO2016156649A1|2016-10-06|
    ES2584961B1|2017-07-04|
    EP3279365A1|2018-02-07|
    US20180073133A1|2018-03-15|
    EP3279365A4|2019-03-20|
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    US15/563,856| US20180073133A1|2015-03-31|2016-03-30|Perishable element for particle bombardment, set of devices for particle bombardment and perishable element and method for determining the etching pattern via particle bombardment of a target|
    PCT/ES2016/070220| WO2016156649A1|2015-03-31|2016-03-30|Perishable element for particle bombardment, set of devices for particle bombardment and perishable element and method for determining the etching pattern via particle bombardment of a target|
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